C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/72 (2006.01) C11D 1/14 (2006.01) C11D 1/83 (2006.01) C11D 1/831 (2006.01)
Patent
CA 2619182
A cleaning composition comprises a first surfactant and a second surfactant. The first surfactant is of the general formula R1-O-(A) mH, wherein R1 is an aliphatic hydrocarbon having from 10 to 16 carbon atoms, A is an alkyleneoxy group, and subscript m is a positive number. The second surfactant is of the general formula R2-O- (B)n,H, wherein R 2 is an aliphatic hydrocarbon having from 12 to 15 carbon atoms, B is an alkyleneoxy group, and subscript n is a positive number. The cleaning composition has an average degree of alkoxylation of from about 3 to about 8 moles and an excess of the first surfactant relative to said second surfactant. The cleaning composition can further comprise a third surfactant in addition to the first and second surfactants. If employed, the third surfactant typically can comprise a linear alkyl sulfonate (LAS) and/or an alkyl ether sulfate (AES).
Produit de nettoyage constitué d'un premier agent de surface et d'un second agent de surface. Le premier a la formule générale R1-O-(A)m H, où R1 est un hydrocarbure aliphatique comptant 10 à 16 atomes de carbone, A est un groupement alkylèneoxy, et l'indice m est un nombre positif. Le second a la formule générale R2-O-(B)n H, où R2 est un hydrocarbure aliphatique comptant 12 à 15 atomes de carbone, B est un groupement alkylèneoxy, et l'indice n est un nombre positif. Le produit de nettoyage possède un degré d'alkoxylation d'environ 3 à environ 8 moles, et le premier agent de surface est en excès par rapport au deuxième. Le produit de nettoyage peut en outre comporter un troisième agent de surface en plus des deux premiers. Le cas échéant, le troisième agent de surface comporte habituellement un sulfonate d'alkyle linéaire (SAL) et/ou un sulfate d'éther alkylique (SEA).
Betke Brian J.
Guiney Kathleen M.
Holland Richard J.
Jefferis Jesse
Basf Corporation
Robic
LandOfFree
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