F - Mech Eng,Light,Heat,Weapons – 16 – K
Patent
F - Mech Eng,Light,Heat,Weapons
16
K
F16K 21/00 (2006.01) F16K 51/00 (2006.01) F16L 55/07 (2006.01)
Patent
CA 2330890
A substantially sputtering-free low-profile low-restriction drain valve is used with a fluid reservoir having a drain opening. The drain valve comprises a valve body, a cap and at least one perforation-sealing member. The valve body has a tubular shank installed in the drain opening and defining a fluid ingress, and a tubular head portion generally coaxial with the tubular shank and defining a chamber in communication with the fluid ingress and having a cross sectional area larger than a cross sectional area of the fluid ingress. The tubular head portion comprises an inner transverse wall extending across the chamber and comprising at least one fluid flow perforation, and a distal end opposite to the shank. The cap is movably assembled to the distal end of the tubular head portion between open and closed positions. This cap defines a fluid egress which, in the open position of the cap, is in communication with the perforation to permit draining of fluid from the reservoir. The perforation-sealing member is interposed between the cap and the tubular head portion and, in the closed position of the cap, seals the perforation to prevent draining of fluid from the reservoir. When the cap is in open position, fluid from the reservoir is drained through the ingress, chamber, perforation and egress. The perforation has a cross sectional area equal to or larger than a cross sectional area of the fluid ingress, while the egress has a cross sectional area equal to or larger than the cross sectional area of the perforation; this avoids leakage and a low restriction operation of the drain valve.
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