Semiconductor device and making method thereof

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

H01L 31/072 (2006.01) H01L 25/075 (2006.01) H01L 29/06 (2006.01) H01L 31/0352 (2006.01) H01L 31/103 (2006.01) H01L 33/00 (2006.01)

Patent

CA 2456679

The present invention presents a semiconductor device (1) which is adapted to a solar cell, and in which a semiconductor element (1) is produced by forming one flat surface (2) on a spherical or substantially spherical silicon single crystal (1a, 1b). A diffusion layer (3) and a substantially spherical pn junction (4) are formed on this semiconductor element (1), and a diffusion-mask thin film (5) and a positive electrode (6a) are formed on the flat surface (2). A negative electrode (6b) is formed at the apex on the opposite side to the positive electrode (6a), and an antireflection film (7) is formed on the surface side of the diffusion layer (3).

L'invention concerne un dispositif à semi-conducteur (10), qui convient à une pile solaire, comprenant un élément semi-conducteur (1) de monocristal de silicium (1a, 1b) sphérique ou généralement sphérique, une face plane (2), une couche de diffusion (3), une jonction p-n (4) généralement sphérique, un film mince (5) pour masque de diffusion, et une électrode positive (6a) installée à la surface de la face plane (2), une électrode négative (6b) placée sur la partie supérieure du côté opposé à l'électrode positive (6a), ainsi qu'un film antireflet (7) disposé sur le côté avant de la couche de diffusion (3).

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device and making method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and making method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and making method thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1723900

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.