Method of continuously measuring substrate concentration

Details Method of continuously measuring substrate concentration Method of continuously measuring substrate concentration

A - Human Necessities

61

B

A61B 5/1473 (2006.01) A61B 5/1486 (2006.01) G01N 27/327 (2006.01) G01N 27/416 (2006.01) G01N 33/66 (2006.01)

Patent

CA 2755728

Analysis equipment is provided, which is capable of fulfilling a demand for miniaturization and ensuring high sensitivity, and which can be produced easily. The present invention relates to a method of continuously measuring a substrate concentration based on a response when a voltage is applied to a sensor. The present invention includes a response voltage application step of applying a response voltage E2 at which a response attributed to a substrate is obtained and a non-response voltage application step of applying a non-response voltage E1 at which the response attributed to the substrate is not obtained or is not substantially obtained. Preferably, the response voltage application step and the non-response voltage application step are repeated alternately.

La présente invention concerne un équipement d'analyse capable de satisfaire une demande de miniaturisation et de garantir une sensibilité élevée, et pouvant être produit facilement. La présente invention porte en outre sur un procédé de mesure continue d'une concentration de substrat, basé sur une réponse obtenue lorsqu'une tension est appliquée à un capteur. La présente invention comprend une étape d'application de tension de réponse, consistant à appliquer une tension de réponse E2 à laquelle une réponse attribuée à un substrat est obtenue, et une étape d'application de tension de non réponse consistant à appliquer une tension de non réponse E1 à laquelle la réponse attribuée au substrat n'est pas obtenue ou n'est pas sensiblement obtenue. De préférence, l'étape d'application de tension de réponse et l'étape d'application de tension de non réponse sont répétées alternativement.

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