C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
C02F 1/72 (2006.01) B01F 3/04 (2006.01) B01F 5/04 (2006.01) C02F 1/74 (2006.01) C02F 1/76 (2006.01) C02F 1/78 (2006.01)
Patent
CA 2373896
In a method of removing organic contaminants from a liquid, an oxidizing gas is formed into sub-micron size bubbles which are dispersed into an initially contaminated liquid, after which the treated liquid is recovered. The oxidizing gas is preferably selected from a group including ozone and chlorine dioxide and is utilized immediately upon its manufacture. An oxidizing liquid may be employed in conjunction with the oxidizing gas.
La présente invention concerne un procédé permettant d'éliminer les contaminants organiques d'un liquide. Dans ce procédé, un gaz oxydant est formé dans des bulles sub-microniques qui sont dispersées dans un liquide initialement contaminé, puis le liquide traité est récupéré. Le gaz oxydant est de préférence choisi dans le groupe comprenant l'ozone et le dioxyde de chlore et est utilisé immédiatement après sa fabrication. Un liquide oxydant peut être conjointement employé avec le gaz oxydant.
Grt Inc.
Kirby Eades Gale Baker
Sherman Jeffrey H.
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