C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/00 (2006.01) A01N 33/12 (2006.01) C11D 1/75 (2006.01) C11D 1/83 (2006.01) C11D 1/835 (2006.01) C11D 1/90 (2006.01) C11D 1/94 (2006.01) C11D 3/20 (2006.01) C11D 3/30 (2006.01) C11D 3/43 (2006.01) C11D 3/48 (2006.01) C11D 1/62 (2006.01) C11D 1/72 (2006.01)
Patent
CA 2269730
Aqueous based cleaning compositions simultaneously featuring disinfecting, low residue deposit and good cleaning characteristics are provided. The compositions include one or more quaternary amine compounds as disinfecting agents, an organic solvent system which includes glycol mono-n-butyl ether or a binary system including a glycol ether with a linear primary alcohol, either one or more betaines, or one or more amine oxides as a surfactant constituent, and an alkanolamine.
L'invention concerne des compositions de nettoyage à base aqueuse, qui présentent des caractéristiques de désinfection, laissent peu de dépôts de résidus et sont efficaces en ce qui concerne le nettoyage. Ces compositions contiennent un ou plusieurs composés amines quaternaires comme agent désinfectant, un système de solvant organique qui contient un glycol mono-n-butyl éther ou un système binaire comprenant un glycol éther avec un alcool primaire linéaire, une ou plusieurs bétaïnes, ou un ou plusieurs oxydes d'amine comme constituant tensioactif, et une alcanolamine.
Gowling Lafleur Henderson Llp
Reckitt & Colman Inc.
Reckitt Benckiser Llc
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