C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 477/00 (2006.01) C07D 205/08 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01) C07D 405/12 (2006.01) C07D 409/12 (2006.01) C07D 413/12 (2006.01) C07D 477/04 (2006.01) C07F 7/10 (2006.01) C07F 7/18 (2006.01)
Patent
CA 2070002
ABSTRACT OF THE DISCLOSURE Compounds of formula (I): Image (I) [wherein: R1 is hydrogen or a hydroxy-protecting group; R2 is alkyl, alkoxy, halogen, optionally substituted phenyl or optionally substituted phenoxy; R3 is optionally substituted pyridyl, optionally substituted quinolyl or phenyl group which has a substituent of formula -CYNR5R6, where Y is oxygen or sulfur, and R5 and R6 are each alkyl, aryl or aralkyl, or R5 and R6 and the nitrogen to which they are attached together form a heterocyclic group; R4 is hydrogen or an amino-protecting group; and Z is sulfur or oxygen]; are valuable intermediates in the preparation of carbapenem compounds and retain a desirable configuration during conversion to such carbapenem compounds.
Akira Yoshida
Hiroo Koyama
Koichi Hirai
Kozo Oda
Takahide Nishi
Marks & Clerk
Sankyo Company Limited
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