Process for depositing barrier film on three-dimensional...

Details Process for depositing barrier film on three-dimensional... Process for depositing barrier film on three-dimensional...

C - Chemistry, Metallurgy

23

C

C23C 16/50 (2006.01) C23C 16/40 (2006.01) C23C 16/509 (2006.01)

Patent

CA 2210599

The invention relates to a Plasma Enhanced Chemical Vapor Deposition (PECVD) process whereby a coating of inorganic material is deposited on three-dimensional articles, including low melting temperature polymer articles. The coating possesses excellent gas and/or water vapor barrier properties.

L'invention porte sur le dépôt chimique en phase vapeur activé par plasma, consistant à appliquer un revêtement de matière minérale sur des articles tri-dimensionnels, incluant des articles en polymères à bas point de fusion. Les revêtements ont un excellent effet barrière pour les gaz et (ou) la vapeur d'eau.

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