Field emission cathodes comprised of electron emitting...

H - Electricity – 01 – J

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H01J 1/02 (2006.01) H01J 1/14 (2006.01) H01J 1/304 (2006.01) H01J 9/02 (2006.01) H01J 9/04 (2006.01) H01J 9/12 (2006.01) H01J 19/06 (2006.01)

Patent

CA 2381701

Electrophoretic deposition provides an efficient process for manufacturing a field emission cathode (10). Particles (9) of an electron emitting material mixed with particles (18) of an insulating material are deposited by electrophoretic deposition on a conducting layer overlying an insulating layer to produce the cathode. By controlling the composition of the deposition bath and by mixing insulating particles (18) with emitting particles (19), an electrophoretic deposition process can be used to efficiently produce field emission cathodes that provide spatially and temporally stable field emission. The deposition bath for the field emission cathode includes an alcohol, a charging salt, water, and a dispersant. The field emission cathodes can be used as an electron source in a field emission source in a field emission display device.

L'invention concerne un dépôt électrophorétique qui fournit un processus efficace de fabrication d'une cathode à émission de champ (10). Des particules (19) d'une matière émettrice d'électrons mélangées à des particules (18) d'une matière isolante sont déposées par dépôt électrophorétique sur une couche conductrice sus-jacente à une couche isolante, afin de produire la cathode. Le contrôle de la composition du bain de dépôt et le mélange des particules isolantes (18) avec les particules émettrices (19) permet d'utiliser le processus de dépôt électrophorétique afin de produire des cathodes à émission de champ fournissant une émission de champ stable dans l'espace et dans le temps. Le bain de dépôt destiné à la cathode à émission de champ comprend un alcool, un sel chargé, de l'eau et un agent dispersant. Les cathodes à émission de champ peuvent être utilisées comme source d'électrons dans un dispositif d'affichage à émission de champ.

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