C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/10 (2006.01) C07C 45/67 (2006.01) C07C 49/82 (2006.01) C07D 233/32 (2006.01) C07D 233/70 (2006.01) C07D 249/12 (2006.01) C07D 401/00 (2006.01) C07D 403/00 (2006.01) C07D 405/00 (2006.01) C07D 409/00 (2006.01) C07D 413/00 (2006.01) C07D 417/00 (2006.01) C07D 471/04 (2006.01) C07D 487/04 (2006.01) C07D 521/00 (2006.01) C07F 7/18 (2006.01)
Patent
CA 2150533
A compound of the formula (V): Image (V) , wherein Ar' is a halogenated phenyl group, R is a hydro- carbon residue having a functional group at the .alpha.-carbon, R3' is an optionally substituted aliphatic or aromatic hydrocarbon residue or an optionally substituted aromatic heterocyclic group, Y and Z are, the same or different, a nitrogen atom or a methine group optionally substituted with a lower alkyl group, and (R) and (S) represent configura- tions, which is an optically active intermediate for produc- tion of optically active triazole compounds (I): Image (I) , wherein the symbols have the same meanings as defined above, and methods of preparing the compounds (V) and (I).
Hosono Hiroshi
Itoh Katsumi
Tasaka Akihiro
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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