C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/445 (2006.01) C07D 519/00 (2006.01)
Patent
CA 2099381
Compounds of formula (I), wherein X is CH or N; Z is CH=CH or S; A is CH2CH2, CH=CH, CH(OH)CH2, or COCH2; B is a direct link or -CH2-, -CH(CH3)- or -C(CH3)2-, or when Z is CH=CH, B may form a cyclopentane ring fused to the attached benzene ring; Y completes a fused benzo or thienyl ring which is optionally substituted by halo or C1-C4 alkyl; n is 0, 1 or 2; and m is 0 or 1; are antagonists of both PAF and histamine H1 having utility in the treatment of allergic inflammatory conditions such as allergic rhinitis.
Alker David
Bass Robert John
Cooper Kelvin
Pfizer Inc.
Smart & Biggar
LandOfFree
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