C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/08 (2006.01) C23C 14/28 (2006.01) H01L 39/24 (2006.01)
Patent
CA 2044439
A laser ablation process for preparing superconducting oxide thin films comprises ablating a target surface with pulsed laser beam to cause deposition of target molecules on a substrate. The incident laser beam on the target surface has an energy of at least 5 J/cm2 per pulse.
Procédé d'ablation par laser servant à préparer des couches minces d'oxyde supraconducteur consistant à effectuer l'ablation d'une surface cible au moyen d'un faisceau laser pulsé pour réaliser le dépôt de molécules cibles sur un substrat. Le faisceau laser incident sur la surface cible possède une énergie d'au moins 5 J/cm2 par impulsion.
Hattori Hisao
Itozaki Hideo
Nagaishi Tatsuoki
Riches Mckenzie & Herbert Llp
Sumitomo Electric Industries Ltd.
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