Positive type resist composition

Details Positive type resist composition Positive type resist composition

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/022 (2006.01) G03F 7/023 (2006.01)

Patent

CA 2089110

ABSTRACT OF THE DISCLOSURE A positive type resist composition comprising an alkali-soluble novolac resin, a quinonediazide compound and a compound represented by general formula (I): Image (I) wherein Y1 to Y10 each represent a hydrogen atom, a hydroxyl group or an alkyl group, provided that at least one of Y1 to Y10 is a hydroxyl group, and X represents one of the groups represented by the following formulas: Image and Image wherein R1 to R3 independently of one another each re- present a hydrogen atom or an alkyl group, provided that, as measured by GPC, the pattern area of the component having a molecular weight, converted to polystyrene, 1,000 or below in the alkali-soluble novolac resin is 25% or less based on the total pattern area of the novolac resin from which the pattern area of the unreacted phenol compound is excepted. This positive type resist composi- tion is excellent in the balance between performances such as sensitivity, resolution, heat resistance and adhesive property.

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