C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/40 (2006.01) A61K 31/435 (2006.01) A61K 31/55 (2006.01) C07D 487/04 (2006.01)
Patent
CA 2121567
Abstract The invention provides compounds of the formula Image wherein R1 represents lower alkyl, lower cycloalkyl, aryl or lower aralkyl, R2 represents hydrogen, aryl or lower alkyl optionally substituted by hydroxy, acyloxy, amino, mono(lower alkyl)amino, di(lower alkyl)amino, carboxy, lower alkoxy- carbonyl or aminocarbonyl and m and n stand for 1 or 2, as well as pharmaceutically acceptable salts of acidic compounds of formula I with bases and of basic compounds of formula I with acids. which are useful in the control or prevention of illnesses, especially in the control or prevention of inflammatory, immunological, oncological, bronchopulmonary, dermatological and cardiovascular disorders, in the treatment of asthma, AIDS or diabetic complications or for the stimulation of hair growth.
Harris William
Hill Christopher H.
Lawton Geoffrey
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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