Liquid cleaning compositions

C - Chemistry – Metallurgy – 11 – D

Patent

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C11D 1/10 (2006.01) C11D 1/83 (2006.01) C11D 1/88 (2006.01) C11D 1/94 (2006.01) C11D 3/22 (2006.01) C11D 3/37 (2006.01) C11D 1/66 (2006.01) C11D 1/72 (2006.01)

Patent

CA 2296438

Liquid cleaning compositions are disclosed which comprise a nonionic surfactant, a polymer and an amphoteric surfactant according to the formula: R1R2R3N or R1R2R3N+X wherein the substituent R1 is a substituted or unsubstituted, saturated or unsaturated, linear or branched hydrocarbon chain having from 6 to 22 carbon atoms, wherein the substituents R2 and R3 each independently are a C1 to C6 alkyl carboxylic acid group, which may be the same or different, and wherein X is hydrogen. These compositions have the advantage to exhibit improved physical stability.

L'invention concerne des compositions de nettoyage liquides comprenant un tensioactif non ionique, un polymère et un tensioactif amphotère de la formule: R¿1?R¿2?R¿3?N ou R¿1?R¿2?R¿3?N?+¿X dans laquelle le substituant R¿1? est une chaîne hydrocarbure substituée ou non substituée, saturée ou non saturée, linéaire ou ramifiée comportant 6 à 22 atomes de carbone, dans laquelle les substituants R¿2? et R¿3? représentent chacun indépendamment un groupe alkyle acide carboxylique, pouvant être identiques ou différents, et dans laquelle X représente hydrogène. Ces compositions ont l'avantage de présenter une meilleure stabilité physique.

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