Process and device for the continuous treatment of silicon

Details Process and device for the continuous treatment of silicon Process and device for the continuous treatment of silicon

C - Chemistry, Metallurgy

01

B

C01B 33/037 (2006.01) C01B 33/02 (2006.01) F27D 3/14 (2006.01)

Patent

CA 2112746

ABSTRACT OF THE DISCLOSURE The invention relates to a process for the continuous treatment of silicon in which a slag in a pivotable low-shaft furnace (1) with a discharge pipe (4) reaching the bottom of the furnace tank is taken to a temperature of 1450 to 1800°C and this slag is used to melt solid silicon and/or liquid silicon is continuously refined and the liquid refined silicon is then sprayed with compressed air or nitrogen (7) and continuously conveyed into a transport crucible (11) by being poured into a stream of water (9) in the channel (8) via a dewatering filter (10) and thus obtained in granular form. The invention also relates to devices for implementing the process.

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