G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/00 (2006.01) B82B 3/00 (2006.01)
Patent
CA 2470823
The present invention includes a method of fabricating organic/inorganic composite nanostructures on a substrate comprising depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography. The nanostructures comprises arrays of lines and/or dots having widths/diameters less than 1 micron. The present invention also includes a device comprising an organic/inorganic composite nanoscale region, wherein the nanoscale region has a nanometer scale dimension other than height.
La présente invention concerne un procédé de fabrication de nanostructures composites organiques/inorganiques sur un substrat. Ce procédé consiste à déposer une solution renfermant un copolymère bloc et un précurseur inorganique sur le substrat au moyen d'une nanolithographie AFM par pointe encreuse. Les nanostructures comprennent des réseaux de lignes et/ou de points présentant des largeurs/diamètres inférieurs à 1 micron. La présente invention concerne également un dispositif comportant une zone nanométrique composite organique/inorganique, cette zone nanométrique présentant au moins une dimension d'échelle nanométrique autre que la hauteur.
Dravid Vinayak P.
Liu Xiaogang
Mirkin Chad A.
Su Ming
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Northwestern University
LandOfFree
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