C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 307/77 (2006.01) C07D 307/83 (2006.01) C08K 5/15 (2006.01) C08K 5/1535 (2006.01) C09K 15/06 (2006.01)
Patent
CA 2096486
A-19100/A 3-(Alkoxyphenyl)benzofuran-2-ones as stabilisers Abstract of thc disclosure: Compounds of the formula (1), Image (1) in which R1 is C1-C25alkyl, C7-C9phenylalkyl, unsubstituted or C1-C4alkyl-substituted phenyl, unsubstituted or C1-C4alkyl substituted C5-C8cycloalkyl; C3-C25alkenyl, C3-C25- alkynyl or C3-C25alkyl which is interrupted by oxygen, sulfur or Image , and R16 is hy- drogen or C1-C8alkyl, R2, R3, R4 and R5, independently of one another are hydrogen, Cl-C25alkyl, C7-C9phenylalkyl, unsubstituted or C1-C4alkyl-substituted phenyl, unsubsti- tuted or C1-C4alkyl-substituted C5-C8cycloalkyl; C1-C18alkoxy, hydroxyl, C1-C25alka- noyloxy, C3-C25alkenoyloxy, C3-C25alkanoyloxy which is interrupted by oxygen, sulfur or Image ; C6-C9cycloalkylcarbonyloxy, benzoyloxy or benzoyloxy which is substituted by Cl-C12alkyl, and R16 is as defined above, or, furthermore, the radicals R2 and R3 or the radicals R4 and R5 together with the carbon atoms to which they are bound form a benzo ring, R4 is additionally -(CH2)n-COR11 , in which n is 0, 1 or 2, R11 is hydroxyl, Image , C1-C18alkoxy or Image , R14 and R15, independently of one an- other are hydrogen or C1-C18alkyl, M is an r-valent metal cation and r is 1, 2 or 3, R7, R8, R9 and R10, independently of one another, are hydrogen, C1-C4alkyl or C1-C4alkoxy, with the proviso that at least one of the radicals R7, R8, R9 and R10 is hydrogen, and, in the case where R3, R5, R6, R7 and R10 are hydrogen, R4 is additionally a radical of the formula (2) Image (2), in which R1, R2, R8 and R9 are as defined above and R12 and R13, independently of one another, are hydrogen, CF3, C1-C12alkyl or phenyl, or R12 and R13 together with the car- bon atom to which they are bound form a C5-C8cycloalkylidene ring which is unsubstitu- ted or substituted by 1 to 3 C1-C4alkyl; R6 is hydrogen or a radical of the formula (3) Image (3) in which R1, R2, R3, R4, R5, R7, R8, R9 and R10 are as defined above, are described as sta- bilisers for organic materials against thermal, oxidative or light-induced degradation.
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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