Production of cationically homogeneous refractory oxides of...

C - Chemistry – Metallurgy – 01 – D

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C01D 1/02 (2006.01) C01D 3/00 (2006.01)

Patent

CA 2455428

This invention relates to a generic process for producing a refractory oxide at a temperature below the melt- ing point of the pure refractory oxide, by reacting and dispersal-blending liquid water with at least one metal oxide reactant and a hydrogen halide composition, to produce a cat- ionically-homogeneous nanostructured colloidal mixture; heating the mixture to a temperature at which a cationically homogeneous nanostructured solid state hydroxyhalide is pro- duced. The solid state hydroxyhalide is heated to its decom- position-temperature, by heat alone, decomposes, into a cat- ionically homogeneous nanostructured solid state oxyhalide; and performing one of the following heating steps: (i) heating the solid state oxyhalide to a solid state oxyhalide decomposition-temperature at which it chemically decomposes, by heat alone, into a cationically homogeneous nanostructured solid state refractory oxide; or (ii) heating the solid state oxyhalide to a molten state decomposition-temperature at which it chemically decomposes, by heat alone, into a cationically homogeneous nanostructured solid state refrac- tory oxide; or (iii) heating the solid state oxyhalide to a vapor state decomposition-temperature at which it chemically decomposes, by heat alone, into a cationically homogeneous nanostructured solid state refractory oxide.

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