Novel metal complexes free from fluorine for gas-phase...

Details Novel metal complexes free from fluorine for gas-phase... Novel metal complexes free from fluorine for gas-phase...

C - Chemistry, Metallurgy

07

F

C07F 1/00 (2006.01) C07F 1/08 (2006.01) C07F 1/10 (2006.01) C07F 7/08 (2006.01) C23C 16/06 (2006.01) C23C 16/18 (2006.01) H01L 21/205 (2006.01)

Patent

CA 2500386

The invention concerns novel copper (I) or silver (I) complexes and their use for gas-phase chemical deposition of metal copper or silver almost free of impurities.

L'Invention a pour objet de nouveaux complexes de cuivre (I) ou d'argent (I) et leur utilisation pour le dépôt chimique en phase gazeuse de cuivre ou d'argent métalliques pratiquement exempts d'impuretés.

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