Photosensitive matrials

Details Photosensitive matrials Photosensitive matrials

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/031 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2094906

2094906 9209934 PCTABS00013 Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.

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