Near infrared sensitive photopolymer and holographic...

G - Physics – 03 – F

Patent

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Details

G03F 7/028 (2006.01) C09K 19/54 (2006.01) G03F 7/00 (2006.01) G03F 7/031 (2006.01) G03H 1/02 (2006.01) G02F 1/1334 (2006.01)

Patent

CA 2298345

The present invention is concerned with photopolymers sensitive to near infrared radiation for initiating polymerization, and to applications of such photopolymers, like holographic polymer dispersed liquid crystal materials (H- PDLC) for making optical devices. The invention also relates to holographic polymer dispersed liquid crystal materials having improved switching speeds.

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