Method for electrochemically metallising an insulating...

C - Chemistry – Metallurgy – 25 – D

Patent

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C25D 5/54 (2006.01)

Patent

CA 2387109

The invention relates to a method for metallising an insulating substrate by depositing a thin, uniform film of metal. An insulating substrate is placed in an electrochemical cell containing a solution of a salt of a metal (M), connected to an anode consisting of said metal (M) and to a cathode and electrolysed with a constant current. The method is characterised as follows: a thin conductive film is applied first to the part of the substrate that is in contact with the cathode; the substrate is then placed in the electrochemical cell in such a way that the surface to be metallised is vertical, the cathode being in the top part; and the electrochemical cell is subjected to a current of an intensity able to create a current density of between 1 and 50 mA/cm?2¿ in the horizontal section of the electrochemical cell at the level of the growing edge of the film being deposited.

L'invention concerne un procédé de métallisation d'un substrat isolant par dépôt d'un film mince uniforme d'un métal. Un substrat isolant est placé dans une cellule électrochimique contenant une solution d'un sel d'un métal M et relié à une anode constituée par le métal M et à une cathode, puis on effectue une électrolyse à courant constant. Le procédé est caractérisé en ce qu'on applique initialement sur le substrat dans la partie en contact avec la cathode, un film mince conducteur; on place le substrat dans la cellule électrochimique de telle manière que la surface à métalliser soit verticale, la cathode étant à la partie supérieure; et on impose à la cellule électrochimique un courant ayant une intensité telle qu'elle crée une densité de courant comprise entre 1 et 50 mA/cm2 dans la section horizontale de la cellule électrochimique à la hauteur du front de croissance du film qui se dépose.

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