Chemical vapor deposition process to replicate the finish...

Details Chemical vapor deposition process to replicate the finish... Chemical vapor deposition process to replicate the finish...

C - Chemistry, Metallurgy

23

C

117/86

C23C 16/44 (2006.01) C23C 16/01 (2006.01) C23C 16/26 (2006.01) C23C 16/30 (2006.01) C23C 16/32 (2006.01) C23C 16/56 (2006.01)

Patent

CA 2027171

ABSTRACT OF THE DISCLOSURE A process is disclosed by which the finish and/or figure of polished preshaped structures (such as mirrors) can be replicated directly by chemical vapor deposition, with only minor polishing of the replica being required to obtain a final product, and with the original substrate being reusable for further replication. Relevant conditions under which the process can be carried out are given. Featured in the process is a pretreatment step prior to the deposition of a layer of silicon carbide to form the replica, which pretreatment step involves the formation on the polished substrate of an oxide layer and a carbon layer of high finish and uniform thickness. The carbon layer allows easy separation of the substrate and replica which otherwise would be bound together.

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