C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 263/52 (2006.01) C08K 5/35 (2006.01) C09D 7/12 (2006.01) C09D 161/28 (2006.01)
Patent
CA 2576900
A compound Image in which n is 0, 1, 2, or 3; R1, R2, R7, and R8 are each independently alkyl group, including cycloalkyl, an alkylaryl group, or an aryl group, optionally with one or more heteroatoms, with the proviso that R1 and R2 can together form a cycloalkylene group and, independently, R7 and R8 can together form a cycloalkylene group; Y is an oxygen free radical, a sulfur free radical, OR9 or SR9; R3, R4, R5, R6, and R9 are each independently H or an alkyl group, a cycloalkyl group, an aryl group, or an alkylaryl group, optionally with one or more heteroatoms; and compositions, such as basecoat and clearcoat coating compositions, containing such compounds.
Composé (I) dans lequel n est 0, 1, 2 ou 3 ; R<SUP>1</SUP>, R<SUP>2</SUP>, R<SUP>7</SUP> et R<SUP>8</SUP> sont chacun indépendamment un groupe alkyle, y compris un groupe cycloalkyle, un groupe alkylaryle ou un groupe aryle, ayant facultativement un ou plusieurs hétéroatomes, à condition que R<SUP>1</SUP> et R<SUP>2</SUP> puissent former ensemble un groupe cycloalkylène et que, indépendamment, R<SUP>7</SUP> et R<SUP>8</SUP> puissent former ensemble un groupe cycloalkylène ; Y est un radical libre de l'oxygène, un radical libre du soufre, OR<SUP>9</SUP> ou SR<SUP>9</SUP> ; R<SUP>3</SUP>, R<SUP>4</SUP>, R<SUP>5</SUP>, R<SUP>6</SUP> et R<SUP>9</SUP> sont chacun indépendamment H ou un groupe alkyle, un groupe cycloalkyle, un groupe aryle ou un groupe alkylaryle, ayant facultativement un ou plusieurs hétéroatomes ; et compositions, telles que des compositions de revêtement de couche de fond et de couche transparente, contenant de tels composés.
Boisseau John
Campbell Donald
Ohrbom Walter
St. Aubin Donald
Basf Corporation
Robic
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