C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 487/04 (2006.01) A61K 31/50 (2006.01) A61K 31/535 (2006.01) A61K 31/55 (2006.01) C07D 471/14 (2006.01) C07D 487/14 (2006.01)
Patent
CA 2120997
ABSTRACT A compound of the formula: Image (I) wherein R1 is a hydrogen atom, a lower alkyl group or a halogen atom; R2 and R3 are a hydrogen atom, a lower alkyl group or a 5- to 7-membered cyclic group formed together with the adjacent -C=C-; X is an oxygen atom, a sulfur atom or a methylene group; Y is an optionally substituted methylene group, a divalent 3- to 7-mem- bered hydrocarbon or heterocyclic group; R6 and R7 are a hydrogen atom, a lower alkyl group, a cycloalkyl group, an aryl group, or a nitrogen-containing hetero- cyclic group formed together with the adjacent nitrogen atom; m is an integer of 0 to 4; and n is an integer of 0 to 4, or a salt thereof. The compound has an excel- lent anti-PAF activity, antiallergic action, etc., thus is useful as an antiasthmatic agent.
Ashida Yasuko
Kajino Masahiro
Miyake Akio
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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