C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 271/22 (2006.01) A01N 47/10 (2006.01) A01N 47/12 (2006.01) A61K 31/27 (2006.01) C02F 1/50 (2006.01) C07C 271/28 (2006.01) C07C 323/50 (2006.01) C08L 101/00 (2006.01) D06M 13/425 (2006.01)
Patent
CA 2055353
ABSTRACT OF THE DISCLOSURE Antimicrobial compounds of the formula Image wherein R1 is selected from the group consisting of H, lower (C1-C4)alkyl, alkyl aryl, CH2OR, CH2SR, and CH(CH3)0R; and R, R2, and R3 are independently selected from H, (C1-C4)alkyl, aryl, arylalkyl, alkaryl, and halopropargyl.
Bowers-Daines Margaret Marie
Lange Barry Clifford
Gowling Lafleur Henderson Llp
Rohm And Haas Company
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