C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/501.1, 260/4
C07F 9/38 (2006.01) C07F 9/40 (2006.01)
Patent
CA 2001340
ABSTRACT Polyether bis-phosphonic acid compounds are disclosed which have the formula (HO)20P-R-(OR')n-OR-PO(OH)2 where R is selected from the group consisting of methylene and ethylene, R' is selected from the group consisting of ethylene and ethylene substituted with one or more methyl groups, and n is an integer from 1 to 4, water soluble salts thereof, and esters thereof with alkyl groups having from 1 to 6 carbon atoms. Also disclosed is a novel preparation of certain of these compounds by reacting certain hydroxyalkylphosphonic acid dialkyl ester compounds with certain 2-benzyloxyalkyl organic sulfonates; reacting the intermediate formed therefrom with hydrogen or a hydrogen source; reacting the intermediate formed therefrom with a hydrogen ion acceptor and certain sulfonyl chlorides; and reacting the intermediate formed therefrom with certain hydroxyalkyl- phosphonic acid dialkyl ester compounds to form a polyether bis-phosphonic acid compound which may be hydrolyzed to form the polyether bis-phosphonic acid. Useful intermediates are disclosed which have the formulas Image , Image HOR'-OR-PO(OR")2' HOR'-OR-PO(OH) 2' and X-02S-OR'-OR-PO(OR") 2' wherein the above-indicated benzene rings of said formulas are optionally substituted with selected groups, wherein R and R' are as defined above, wherein R" is an alkyl group having from 1 to 6 carbon atoms, and wherein X is selected from Image and alkyl groups having from about 1 to 6 carbon atoms.
Carter Charles G.
Kumar Ranjit
Betzdearborn Inc.
Gowling Lafleur Henderson Llp
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