Method of removing organic materials from substrates

Details Method of removing organic materials from substrates Method of removing organic materials from substrates

B - Operations, Transporting

08

B

B08B 3/00 (2006.01) B08B 7/00 (2006.01) C23G 1/00 (2006.01) G03F 7/42 (2006.01) H01L 21/306 (2006.01)

Patent

CA 2341548

Water-free, gaseous sulfur trioxide is used as an agent to remove various organic coatings, films and residues from the surface of substrate when used in conjunction with certain other physical and chemical treatments (10, 14, 16, and 18) applied at the appropriate time during the process.

L'invention concerne le trioxyde de soufre gazeux, exempt d'eau, en tant qu'agent pour éliminer divers revêtements, couches minces et résidus organiques de la surface d'un substrat, lorsqu'il est utilisé conjointement avec certains autres traitements physiques et chimiques (10, 14, 16 et 18) appliqués au moment approprié durant le processus.

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