Methods for removal of water from gases using superheated...

B - Operations – Transporting – 01 – D

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B01D 53/04 (2006.01) B01D 53/26 (2006.01) B01J 20/18 (2006.01)

Patent

CA 2345968

A method for removing trace moisture from a gas is disclosed. The method involves heating a zeolite having a high silica-to-alumina ratio to about 400 ~C to remove physically absorbed water from the zeolite, followed by heating the zeolite to a temperature in excess of 650 ~C, to form a superheated zeolite. Heating to temperatures of 650 ~C or above is believed to cause dehydroxylation of the zeolite. A method for the preparation of a dehydroxylated zeolite is also disclosed. The superheated zeolite is contacted with the gas, thereby adsorbing water from the gas. A dehydroxylated zeolite for removing trace moisture from a gas wherein the zeolite has a high silica- to-alumina ratio and a low level of metallic impurities is also disclosed. The zeolite and methods of the invention are particularly useful for removing trace water from acid gases such as hydrogen chloride and hydrogen bromide.

L'invention concerne un procédé permettant d'éliminer toute trace d'humidité dans un gaz. Ledit procédé consiste à chauffer une zéolite présentant un rapport silice/alumine élevé à environ 400 ·C afin d'éliminer l'eau physiquement absorbée par la zéolite, puis à chauffer la zéolite à une température supérieure à 650 ·C, afin de former une zéolite surchauffée. On suppose que ce chauffage à des températures supérieures ou égales à 650 provoque la déshydroxylation de la zéolite. L'invention concerne également un procédé de préparation d'une zéolite déshydroxylée. La zéolite surchauffée est mise au contact du gaz, absorbant ainsi l'eau présente dans la gaz. L'invention concerne en outre une zéolite déshydroxylée destinée à éliminer toute trace d'humidité dans un gaz, ladite zéolite présentant un rapport silice/alumine élevé ainsi qu'une faible teneur en impuretés métalliques. La zéolite et les procédés selon l'invention sont particulièrement utiles pour l'élimination de traces d'eau dans des gaz acides tels que le chlorure d'hydrogène et le bromure d'hydrogène.

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