Improvement in aqueous stripping and cleaning compositions

Details Improvement in aqueous stripping and cleaning compositions Improvement in aqueous stripping and cleaning compositions

C - Chemistry, Metallurgy

09

D

C09D 9/00 (2006.01) B08B 3/08 (2006.01) C11D 3/20 (2006.01) C11D 3/30 (2006.01) C11D 3/34 (2006.01) C11D 3/43 (2006.01) C11D 7/50 (2006.01) C11D 11/00 (2006.01) C23G 5/036 (2006.01) G03F 7/32 (2006.01) G03F 7/42 (2006.01)

Patent

CA 2306954

An aqueous stripping composition comprising a mixture of a polar amine, an organic or inorganic amine and a corrosion inhibitor which is gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any susbtantial amount of metal ions.

L'invention porte sur une composition aqueuse de dépouillage comprenant un mélange d'un amine polaire, d'un amine inorganique et d'un inhibiteur de corrosion (acide gallique), ainsi que sur un ester ou analogue de ladite composition. Cette composition de dépouillage peut décaper efficacement des photorésines, des résidus de matières organiques ou organométalliques provenant d'un traitement au plasma, des sels inorganiques, des oxydes, des hydroxydes ou des composés combinés avec ou sans des films à photorésine organiques obtenus à basses températures sans dépôt supplémentaire d'une quelconque quantité importante d'ions métalliques.

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