C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 413/10 (2006.01) C07D 263/14 (2006.01) C07D 413/14 (2006.01) C07D 471/10 (2006.01) C07D 491/113 (2006.01) C07D 498/10 (2006.01) C08K 5/353 (2006.01)
Patent
CA 2209008
A description is given of compounds of the formula I (see fig. I) where r is 0 or 1 and y is a number from the range 1-3; X is a direct bond or -NR8-, -CO-, -CONH- or -COO- or a divalent aliphatic or mixed aromatic-aliphatic C1-C18 hydrocarbon radical; Z is an aromatic, aliphatic or mixed aromatic-aliphatic C3-C18 hydrocarbon radical which is interrupted in the aliphatic moiety by one or more divalent functional groups, in each case in a carbon-carbon single bond, and/or in the aromatic or aliphatic moiety by one or more divalent functional groups, in each case in a carbon-hydrogen bond, possible functional groups being -O-, -NR8-, -S-, -SO-, -SO2-, -CONH-, -CO- or -COO-; R is a mono-, di- or trivalent radical of a sterically hindered amine or of a UVabsorber from the class of the 2-hydroxyphenylbenzotriazoles, 2-hydroxyphenyl- benzophenones, oxalanilides or 2-hydroxyphenyl-4,6-diaryltriazines or a di- or trivalent radical of a sterically hindered phenol; R1 and R2, independently of one another, are H or C1-C12alkyl; R3 and R4, independently of one another, are H, C1-C18alkyl or -X-(Z)r-R5; R5 is a monovalent radical of a sterically hindered amine or of a UV absorber from the class of the 2-hydroxyphenylbenzotriazoles, 2-hydroxyphenylbenzophenones, oxalanilides or 2-hydroxyphenyl-4,6-diaryltriazines or a radical of a stericallyhindered phenol; and R8 is H, C1-C18alkyl, C7-C11phenylalkyl, C2-C6alkoxyalkyl or C5-C12cycloalkyl. Compounds of the formula I can be employed with advantage for stabilizing organic material against the damaging effect of light, oxygen and/or heat.
Mulhaupt Rolf
Steinmann Alfred
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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