Block oligomers containing 2,2,6,6-tetramethyl-4-piperidyl...

Details Block oligomers containing 2,2,6,6-tetramethyl-4-piperidyl... Block oligomers containing 2,2,6,6-tetramethyl-4-piperidyl...

C - Chemistry, Metallurgy

07

D

C07D 493/10 (2006.01) C07D 401/14 (2006.01) C07D 405/14 (2006.01) C08K 5/3435 (2006.01) C08K 5/3492 (2006.01) C09K 15/30 (2006.01)

Patent

CA 2191832

Compounds of the formula (I) (see formula I) in which the polydispersity ~w/~n is 1; n is 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14 or 15; the radicals R1 are for example hydrogen or C1-C8alkyl; R2 is for example C2- C12alkylene; the radicals A are independently of one another -OR3, -N(R4)(R5) or a group of the (see formula II) R3, R4 and R5, which are identical or different, are for example hydrogen or C1-C18alkyl, or -N(R4)(R5) is additionally a group of the formula (see formula III) with Y being -O-, -CH2-, -CH2CH2- or > N-CH3; X is -O- or > N-R6; R6 is for example hydrogen or C1- C18alkyl; R is preferably a group of the formula (see formula IV) and the radicals B have independently of one another one of the definitions given for A; with the proviso that in the individual recurrent units of the formula (I), each of the radicals B, R, R1 and R2 has the same or a different meaning. The indicated compounds are useful as light stabilizers, heat stabilizers and oxidation stabilizers for organic materials, in particular synthetic polymers.

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