C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/22 (2006.01) C23C 16/40 (2006.01) C23C 16/448 (2006.01) C23C 16/453 (2006.01) C23C 16/513 (2006.01) C30B 25/10 (2006.01)
Patent
CA 2158568
A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at least partially vaporized into a vapor phase, and contacting the vapor phase of the reagent to asubstrate resulting in the deposition, at least in part from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred orientation on the substrate, and an apparatus to accomplish this method. The figure shows a schematic of a CCVD apparatus where the substrate (22) can be placed within the reducing region (32) of the Smithell separator (30) between the inner flame (18a) and the outer flame (18b) .
Carter William Brent
Cochran Joe K.
Hunt Andrew T.
Finlayson & Singlehurst
Georgia Tech Research Corporation
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