G - Physics – 02 – B
Patent
G - Physics
02
B
345/46, 88/0.2
G02B 5/18 (2006.01) G03F 7/00 (2006.01) H01L 21/308 (2006.01) H01S 3/1055 (2006.01) H01S 5/12 (2006.01)
Patent
CA 2023510
ABSTRACT OF THE DISCLOSURE A method of manufacturing a diffraction grating includes the steps of applying to a substrate in which a diffraction grating is to be formed a film of a light sensitive resist having a developing rate that varies with the intensity of light to which the resist is exposed, the resist exhibiting a minimum developing rate upon exposure to a first intensity of light and higher developing rates upon exposure to light intensities exceeding and less than the first intensity, exposing the resist film to light incident on the film in a pattern of interference fringes having a period, the pattern including light intensities exceeding and less than the first intensity, developing the resist film and etching the substrate using the developed resist film as a mask to produce a diffraction grating having a period smaller than the period of the pattern of interference fringes.
Fujiwara Masatoshi
Ohkura Yuji
G. Ronald Bell & Associates
Mitsubishi Denki Kabushiki Kaisha
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