C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 401/04 (2006.01) A61K 31/47 (2006.01) A61K 31/505 (2006.01) A61K 31/535 (2006.01) A61K 31/675 (2006.01) A61K 31/695 (2006.01) C07D 401/14 (2006.01) C07D 403/14 (2006.01) C07D 405/14 (2006.01) C07D 409/14 (2006.01) C07D 413/14 (2006.01) C07D 417/14 (2006.01) C07F 5/02 (2006.01) C07F 7/10 (2006.01) C07F 9/6558 (2006.01)
Patent
CA 2242242
The present invention relates to a quinolone- carboxylic acid derivative represented by the general formula [1], or its salt: (see formula I) Of the compounds of the present invention, preferable are compounds in which R2 represents a substituted or unsubstituted cycloalkyl group; R3 represents at least one member selected from the group consisting of a hydrogen atom, a halogen atom, a substituted or unsubstituted lower alkyl or lower alkoxy group, and a protected or unprotected hydroxyl or amino group; R4 represents a hydrogen atom or a substituted or unsubstituted lower alkyl group; each of R5 and R6 represents a hydrogen atom; and A represents C-Y in which Y represents a halogen atom, a lower alkyl or lower alkoxy group which may be substituted by one or more halogen atoms, or a protected or unprotected hydroxyl group.
L'invention porte sur des dérivés de l'acide quinolonecarboxylique ou leurs sels, de formule générale (I), dont les préférés sont des composés dans lesquels: R<2> représente cycloalkyle facultativement substitué; R<3> représente au moins l'un des éléments choisis parmi H, halogéno, alkyle ou alkoxy inférieur facultativement substitué, et hydroxy ou amino facultativement protégé; R<4> représente H, ou alkyle inférieur facultativement substitué; R<5> et R<6> représentent chacun H; et A représente C-Y (où Y représente halogéno, alkyle inférieur ou alkoxy substitués chacun par halogéno ou hydroxy facultativement protégé).
Hayashi Kazuya
Narita Hirokazu
Takahata Masahiro
Todo Yozo
Watanabe Yasuo
Marks & Clerk
Toyama Chemical Co. Ltd.
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