G - Physics – 02 – B
Patent
G - Physics
02
B
G02B 6/136 (2006.01) G02B 5/26 (2006.01) G02B 6/124 (2006.01) G02B 6/12 (2006.01)
Patent
CA 2259350
The present invention provides a method of fabricating grating on the designated areas of optical waveguide devices that contain photo-refractive material in at least one of the core and cladding regions. The said optical waveguides are fabricated or embedded on a sample substrate by one of the associated suitable methods. Using the first mask, having openings corresponding to areas allocated for writing gratings on the waveguide circuit, and conventional lithography, the said waveguide circuit is covered by a masking material , such as chromium or any other suitable material, exempt those areas allocated for writing gratings by the exposure to a particular electromagnetic radiation spectrum for which the waveguide is photo-refractive in at least one of the core or cladding areas. Alignment markers are also transferred onto the sample at this stage. Then we fabricate the phase mask, which is a copy of the said first mask except that it is containing the phase gratings on the open areas of the first mask. Then we place strips of a soft gasket with a desired thickness on the side edges of the patterned sample and then place and attach the said phase mask over the sample by means of clips or the like so as to allow a desired distance between the phase mask and the sample. Using a mask aligner and by aligning the markers on the sample and the phase mask we make sure the phase gratings are exactly placed on the designated areas for writing gratings. The sample with the phase mask attached over it is then exposed to the said particular electromagnetic radiation for a certain time to create a grating on the designated areas. After imprinting the grating on the designated areas the said phase mask is removed for later use. Final adjustment of the grating device is done at the latest stage of manufacturing or by the consumer by further exposure to an attenuated electromagnetic radiation to tune the average refractive index alteration on the desired areas and achieve the desired wavelength response from the waveguide circuit by monitoring the wavelength response. Since in this method the phase mask is attached to the sample, writing grating can be done under less constrained conditions in terms of vibration and the quality of electromagnetic radiation used for imprinting the grating. Several gratings can be fabricated over the waveguide circuit at the same time without a need for precise mechanical motions. Long fiber grating also can be fabricated by the same principle by embedding fibers in a planar base.
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