C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/613, 260/328
C07D 335/12 (2006.01) C08G 85/00 (2006.01)
Patent
CA 1120181
ABSTRACT OF THE DISCLOSURE Triarylsulfonium salts are provided having chemically combined sulfur or oxygen containing monovalent polyaryl radicals. The triarylsulfonium salts can be used as cationic photoinitiators to effect the deep section cure of a variety of organic resin compositions.
361443
Crivello James V.
Lam Julia H.
Company General Electric
Eckersley Raymond A.
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