Triarylsulfonium hexa-fluoro phosphate and arsenate...

C - Chemistry – Metallurgy – 07 – D

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C07D 335/12 (2006.01) C08G 85/00 (2006.01)

Patent

CA 1120181

ABSTRACT OF THE DISCLOSURE Triarylsulfonium salts are provided having chemically combined sulfur or oxygen containing monovalent polyaryl radicals. The triarylsulfonium salts can be used as cationic photoinitiators to effect the deep section cure of a variety of organic resin compositions.

361443

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