C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
530/5.04, 260/51
C07K 5/02 (2006.01) A61K 38/00 (2006.01)
Patent
CA 1158236
Abstract of the Disclosure The invention relates to a process for the manufacture of phenylacetic acid amide compound of the formula Image (I) in which R1 is hydrogen, lower alkyl, lower alkoxy, halogen having an atomic number of not more than 35 or trifluoromethyl, R2 is hydrogen, lower alkyl, lower alkoxy, halogen having an atomic number of not more than 35 or trifluoromethyl, R3 is hydrogen, lower alkyl, lower alkoxy or halogen having an atomic number of not more than 35 and R4 is hydrogen, lower alkyl, lower alkoxy or halogen having an atomic number of not more than 35, and in which R5 is a radical of aliphatic character containing the group R6, R6 and R7 are each hydrogen or together are a divalent aliphatic radical and the group of the formula -C(=O)-R8 (Ia) is a carboxyl group, which can be functionally modified, having an anti-inflammatory action, and their salts, by methods known per se.
302951
Baschang Gerhard
Sallmann Alfred
Fetherstonhaugh & Co.
Novartis Ag
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