Exposure control system employing blade sensing follow focus...

G - Physics – 03 – B

Patent

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Details

95/76, 95/53.3,

G03B 7/14 (2006.01) G03B 7/081 (2006.01)

Patent

CA 1047819

Abstract of the Disclosure An exposure control system for photographic apparatus utilizing pulse driven shutter-diaphragm light regulating elements in conjunction with a follow focus mechanism which in response to the location of the light regulating elements terminates the driving operation thereby automatically selecting an aperture value for flash operation. The follow focus mechanism locates a sensor switch in the path of travel of a pair of aperture defining blades as a function of scene ranging such that the sensor switch is actuated by the blades as the latter are displaced to the selected switch location and, in turn, terminates further pulses to the stepper motor thereby stopping the blades at a predetermined location defining a selected aperture value.

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