Positive-working resist composition including a 1,2 quinone...

Details Positive-working resist composition including a 1,2 quinone... Positive-working resist composition including a 1,2 quinone...

G - Physics

03

C

96/160

G03C 1/60 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1151460

-0- POSITIVE-WORKING RESIST COMPOSITION AND IMAGING METHOD HAVING IMPROVED DEVELOPMENT RATES Abstract There are disclosed a resist composition and imaging method wherein the development rate of the com- position is improved by using a polyhalogenated hetero- cyclic sensitivity-enhancing agent.

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