C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/643, 260/472
C07C 17/26 (2006.01)
Patent
CA 1162200
Abstract Tetrahydronaphthalene and indane derivatives of the formula Image I wherein n signifies 1 or 2; Z signifies mercapto or a group -S(O)mR, m signifies 0, 1 or 2; R signifies lower-alkyl, lower- -alkenyl, lower-alkoxy-lower- -alkyl, lower-alkanoyl-lower-alkyl, hydroxy-lower-alkyl, halo-lower- -alkyl, lower-carbalkoxy-lower- -alkyl or, when m signifies 1 or 2, also lower-alkoxy, hydroxy, mono- -lower-alkylamino or di-lower-alkyl- amino, and pharmaceutically compatible salts of suphonic acids and sulphinic acids of formula I are active topically or systemically against neoplasms and dermatoses. They can be manufactured by a Wittig reaction from a bicyclic component and a monocyclic component as well as by modifying the group denoted by Z or by transforming precursors of the group Z.
392846
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited
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