Photoresist developer including an alkali metal hydroxide...

Details Photoresist developer including an alkali metal hydroxide... Photoresist developer including an alkali metal hydroxide...

G - Physics

03

C

96/208, 96/266

G03C 5/40 (2006.01) G03F 1/08 (2006.01) G03F 7/32 (2006.01)

Patent

CA 1166507

Abstract of the Disclosure A developing solution for use with imaging film comprising a photoresist layer over an aluminum coated substrate and the process of developing the film are shown to be rapid acting. The developing solution comprises an aqueous solution having a pH of at least 12.5 of an alkali metal hydroxide and a chelating agent having a stability constant for Al+3 of at least 6.70.

374669

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