Developing exposed negative-working diazonium salt layers...

Details Developing exposed negative-working diazonium salt layers... Developing exposed negative-working diazonium salt layers...

G - Physics

03

F

96/266, 96/63

G03F 7/32 (2006.01)

Patent

CA 1165164

Abstract of the Disclosure The invention relates to a developer mixture for developing exposed, light-sensitive reproduction layers which contain a dia- zonium salt polycondensation product. The mixture comprises water, a salt of an alkanoic acid and a surfactant and contain 0.5 to is percent by weight, in particular 1 to 10 percent by weight, of at least one salt of an alkanoic acid having 8 to 13 carbon atoms and 0.5 to 20 percent by weight, in particular 1 to 12 percent by weight, of at least one low-foaming, nonionic sur- factant. These surfactants preferably include optionally modified block polymers formed from ethylene oxide and propylene oxide. The invention also relates to a process for developing negative-working reproduction layers, of the composition indicated above, with the developar mixture according to the invention.

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