Method for fabricating beryllium structures

Details Method for fabricating beryllium structures Method for fabricating beryllium structures

B - Operations, Transporting

22

F

75/156

B22F 3/10 (2006.01) B22F 5/00 (2006.01) C22C 1/04 (2006.01)

Patent

CA 1061607

ABSTRACT OF THE DISCLOSURE Thin-walled beryllium structures are prepared by plasma spraying a mixture of beryllium powder and about 2500 to 4000 ppm silicon powder onto a suitable substrate, removing the plasma- sprayed body from the substrate and placing it in a sizing die having a coefficient of thermal expansion similar to that of the beryllium, exposing the plasma-sprayed body to a moist atmosphere, outgassing the plasma-sprayed body, and then sintering the plasma- sprayed body in an inert atmosphere to form a dense, low-porosity beryllium structure of the desired thin-wall configuration. The addition of the silicon and the exposure of the plasma-sprayed body to the moist atmosphere greatly facilitate the preparation of the beryllium structure while minimizing the heretofore dele- terious problems due to grain growth and grain orientation.

262039

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