C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 260/315
C07D 409/06 (2006.01) C07D 233/04 (2006.01) C07D 333/24 (2006.01) C07D 333/34 (2006.01) C07D 333/74 (2006.01) C07D 495/04 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1097351
291993 Abstract of the Disclosure The present invention provides processes for the production of new imidazole derivatives of the general formula I Image (I) wherein Het represents 1H-imidazol-1-yl which is unsubstituted or is substituted by lower alkyl, one of the symbols X and Y represents the epithio radical -S- or the ethenylene group -CH=CH-, and the other represents the direct bond, and n represents 1 to 4, and besides the substitution of ring A or B by the radical -CnH2n-Het, ring A is substituted by chlorine or methyl or is unsubstituted, ring B is substituted by chlori?? ???hyl or methoxy or is unsubstituted , and ring C is unsubstituted or is monosubstituted by halogen up to atomic number 35, trifluoromethyl, lower alkyl, lower alkoxy or lower alkylthio, and of the mon?acid acid addition salts thereof. These new substances possess pharm?cological propert??s which are characteristic for antidepressants, and can be used for the treat- ment of mental depressions.
291993
Blattner Hans
Storni Angelo
Fetherstonhaugh & Co.
Novartis Ag
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