C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/313, 167/9.7
C07D 249/08 (2006.01) A01N 43/64 (2006.01) A01N 43/653 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1150279
Abstract of the Disclosure A triazolyl-alkene of the formula Image in which R is an alkyl radical or an optionally substituted phenyl radical, R1 is a cycloalkyl radical, and R2 is a hydrogen atom, or R1 and R2 together, in the o-position relative to each other, are an optionally substituted, polymeth-lene bridge, or, together with the phenyl ring, are naphthyl, R3 is a halogen atom or an alkyl, alkoxy or halogenoalkyl radical, n is 0, 1, 2 or 3, and X is a keto radical or a -CH(OH)-radical, or an acid addition salt or metal salt complex thereof, which possesses fungicidal activity.
356542
Brandes Wilhelm
Buchel Karl H.
Draber Wilfried
Frohberger Paul-Ernst
Paul Volker
Aktiengesellschaft Bayer
Fetherstonhaugh & Co.
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