Compounds

Details Compounds Compounds

C - Chemistry, Metallurgy

07

D

260/255, 260/245

C07D 239/47 (2006.01) C07D 213/54 (2006.01) C07D 213/55 (2006.01) C07D 213/84 (2006.01) C07D 213/89 (2006.01) C07D 239/46 (2006.01) C07D 307/54 (2006.01) C07D 333/24 (2006.01) C07D 401/06 (2006.01) C07D 401/14 (2006.01) C07D 403/00 (2006.01) C07D 403/12 (2006.01) C07D 405/06 (2006.01) C07D 405/12 (2006.01) C07D 405/14 (2006.01) C07D 409/06 (2006.01) C07D 409/14 (2006.01) C07D 417/14 (2006.01)

Patent

CA 1155842

ABSTRACT The invention provides compounds of the formula (I): Image (I) and their pharmaceutically acceptable acid addition salts a process for their preparation and their use as histamine H2-antagonists. In formula (I) W is a 2-furanyl or 2- thienyl group optionally substituted in the 5-position with a group R1R2N(CH2)m-; a phenyl group substituted in the 3- or 4-position with a group R1R2N(CH2)m-; a 4- imidazolyl group optionally substituted in the 5-position with methyl or bromine; a 2-pyridyl group optionally substituted in the 3-position with C1-4 alkyl, C1-4 alkoxy, halogen, amino or hydroxy; a 2-thiazolyl group or a 2-guanidino-4- thiazplyl group; X is methylene or sulphur and Y is methylene or, provided X is methylene and W is a substituted phenyl group, oxygen; Z is hydrogen or C1-4 alkyl ; and B is a 2- furanyl or 2-thienyl group substituted in the 5-position by a group R1R2N(CH2)m-; a phenyl group substituted in the 3- or 4-position by a group R1R2N(CH2)m-; or a 3-pyridyl group substituted in position 5 or 6 or a 4-pyridyl group substituted in position 2 or a 2-pyridyl group substituted in position 4 or 5 by a group R1R2N(CH20M; R1 and R2 are C1-4 alkyl or together with the nitrogen atom to which they are attached form a pyrrolidino, piperidino or morpholino group; m is 1 to 4.

373475

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