Method for coating a substrate

Details Method for coating a substrate Method for coating a substrate

C - Chemistry, Metallurgy

23

C

204/96.08, 204/9

C23C 14/35 (2006.01) B05D 7/24 (2006.01)

Patent

CA 1044177

Abstract of the Disclosure A method and apparatus for coating a substrate with a layer of polymerized material by simultaneous glow discharge polymerization and sputtering is disclosed. A substrate and two electrodes are placed in a chamber which can be evacuated. An appropriate pressure of a gas which can form a polymer is introduced into the chamber. A glow discharge is established in the gas. Molecules of starting gas and reactive species created in the glow discharge deposit on the electrodes and on the substrate. Material deposited on at least one or ? elec- trodes is sputtered onto the substrate by applying an ?ectric potential, preferably an ac potential, across the electrodes. The glow discharge is preferably confined to a region adjacent to the sputtered electrode. This confinement may be accom- plished by the use of a planar magnetron sputtering cathode. The method and apparatus disclosed allow the rapid deposition of high quality polymer coatings at low gas pressures.

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