C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/555.3, 260/3
C07C 333/02 (2006.01) A01N 37/24 (2006.01) A01N 37/32 (2006.01) A01N 37/46 (2006.01) A01N 47/20 (2006.01) A01N 47/34 (2006.01) C07D 207/404 (2006.01) C07D 207/408 (2006.01)
Patent
CA 1064041
Abstract of the Disclosure Compounds having the formula Image in which X is chloro or methyl; n is zero, one or two: Y is chloro or trifluormethyl; R1 is hydrogen, alkyl, lower alkoxy, lower haloalkyl, thio-lower alkyl, or alkenyl: R2 is hydrogen, lower alkoxy-alkyl or lower alkenoyl; or R1 and R2 taken to- gether is Image or in which Y is hydrogen, n is o, R1 is thiomethyl and R2 is hydrogen. The compounds are useful as post-emergence herbicides, particularly as post-emergence, post-flooding herbicides, for use in connection with rice cultivation.
257391
Na
Stauffer Chemical Company
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